The SIOS NPP-1 nanomeasurement and positioning platform allows positioning in a range of about 100 mm. The high resolution of the laser interferometers used for control, the rigid architecture of the positioning system, the air-bearing axes of the positioning system and an optimized control system allow the position deviations and path fidelity of the movements < 2 nm RMS.
The measurement object is placed directly on a moving mirror. The position and the rotation of the mirror are detected interferometrically.
Ultra-stable interferometers of the SP-DI/F series are used in this system. The light from a stabilized laser is transmitted via optical fibers from the electronics unit to the interferometer heads. This results in a compact and temperature-stable design of the NPP-1.
With a payload of up to 5 kg, even larger and heavier objects can be positioned with high precision using the platform. The principle of the NPP-1 nanopositioning system is designed to be scalable and thus the system can be customized on request.
Download technical datasheet here.
- 2.5 D positioning and measuring system of highest accuracy
- measurement and positioning range: surface Ø 100 mm
- lateral measurement resolution ≤ 0.02 nm
- control: 3 fiber-coupled differential interferometers
- Metrological repeatability by using the HeNe lasers at 633 nm as the light source for the interferometers.
- Atomic force microscopes as probing measuring system, others on request
- open device architecture enables application of customer-specific sensors
- The NPP-1 is controlled via PC software. A user API is available.
Areas of Application
- positioning, manipulation, processing and measurement of objects of microelectronics, micromechanics, optics, microsystems technology with nanometer precision in large spatial ranges
- continuous AFM scans over large areas are possible
- open device architecture, use of customer-specific probing sensors is possible
Ideal for
- nanostructuring
- research / development
Measurement principle of the nanopositioning platform
