Ekspla's High energy ANL MM series lasers are designed to produce high energy nanosecond pulses at 1064 nm. High pulse energy, excellent pulse-to-pulse energy stability, superior beam quality makes these systems well suited for applications like OPO or Ti: Sapphire pumping, material processing and plasma diagnostics and others.
ANL MM series Q-switched oscillators are designed as extremely reliable and stable nanosecond seeding sources producing hundreds mJ pulses from a compact sized body. Simple access to critical compartments of the oscillator allows for easy maintenance. The higher M² version uses a pro-longed oscillator design that allows a much higher number of modes to oscillate which results in M² value up to 90. In this case the beam profile becomes very homogenous and flat which can be useful in a number of applications.
ANL series linear amplifiers are cost effective solution for high energy nanosecond systems. Advanced beam shaping ensures smooth, without hot spots beam spatial profile at the laser output. Low light depolarization level allows high efficiency generation of up to 4th harmonic with optional build-in harmonic generators. The simple and field proven design ensures easy maintenance and reliable long-term operation of the ANL MM series laser.
Angle-tuned non-linear crystals harmonic generators mounted in temperature stabilized heaters are used for second, third and fourth harmonic generation. Harmonic separation system is designed to ensure high spectral purity of radiation and direct it to the output ports. Harmonic generators can be integrated into laser head or placed outside laser head into auxiliary harmonic generator module. Output wavelength switching is done manually. Motorized wavelength switching is available by request.
Triggering of the laser is possible from built-in internal or external pulse generator. Pulses with TTL levels are required for external triggering. Laser pulses have less than 0.5 ns RMS jitter with respect to Q-switch triggering pulse in both cases.
System control is available through control pad, USB and LAN interfaces (RS232 as optional). The system can be controlled from personal computer with supplied software for Windows operating system.
- High energy nanosecond lasers
- Up to 10 J pulse energies
- 5 ns pulse duration
- 10 or 20 Hz pulse repetition rate
- Better than 0.5% RMS pulse energy stability
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FEATURES
- High energy nanosecond lasers
- Up to 10 J pulse energies
- 5 ns pulse duration
- Up to 20 ns pulse duration options available
- 10 or 20 Hz pulse repetition rate
- Better than 0.5% RMS pulse energy stability
- Up to 90 M² version available
- High efficiency pump chambers and advanced beam shaping for maximum pulse energy extraction
- Relay imaging between amplifier stages for smooth beam profile at the laser output
- Thermally induced birefringence compensated
- Optional temperature stabilized second, third, fourth and fifth harmonic generators
- Low jitter internal/external synchronization
- Robust and stable laser head
- Control through keypad, USB and LAN interfaces with supplied Windows control software (RS232 as optional)
APPLICATIONS
- OPO, Ti: Sapphire, dye laser pumping
- Material processing
- Plasma generation and diagnostics
- Nonlinear spectroscopy
- Remote sensing