Edmund Optics TECHSPEC® Extreme Ultraviolet (EUV) Flat Mirrors are multilayer mirrors designed for maximum achievable reflectance at the design wavelength and angle of incidence. These mirrors feature a coating deposited on a super-polished single crystal silicon substrate and surface roughness less than 3Å RMS. The 45° AOI mirrors are useful for steering s-polarized beams, while the 5° AOI mirrors may be used with unpolarized beams. Applications for EUV mirrors include Coherent Diffractive Imaging (CDI) and materials science research. TECHSPEC Extreme Ultraviolet (EUV) Flat Mirrors can also serve as harmonic selectors for High Harmonic Generation (HHG) beams.

  • Maximum Achievable Reflection at 13.5nm
  • Designed for EUV Beam Steering and Harmonic Separation
  • 5° and 45° AOI Versions Available
Common Specifications
 
Substrate: Single Crystal Silicon
 
Diameter (mm): 25.40 ±0.25
 
Coating: Mo/Si Multilayer

Top Layer: Silicon
 
Coating Type:Metal/Semiconductor
 
Surface Roughness (Angstroms): <3 RMS
 
Thickness (mm): 6.35
 
Thickness Tolerance (mm): 0.508
 
Surface Flatness (P-V): λ/10 @ 632.8nm