NL310 series high energy nanosecond q switched NdYAG lasers 1

High pulse energy Ekspla  NL310 series lasers are targeted for applications like OPO or Ti: Sapphire pumping, material processing and plasma diagnostics. These lasers can produce pulse energies up to 10 J in fundamental wavelength at 10 Hz pulse repetition rate.

For the convenience of customers the NL310 series nanosecond Q-switched laser can be controlled either through a user-friendly remote keypad or USB-CAN port. The remote keypad allows easy control of all parameters and features a backlit display that is easy to read even wearing laser safety eyewear. Software for Windows™ operating system is provided to control the laser from PC. LabView™ drivers are supplied as well, allowing laser control integration into existing Labview™ programs.

The optional second (SH, 532 nm), third (TH, 355 nm), fourth (FH, 266 nm) and fifth (FiH, 213 nm) harmonic generators can be integrated into laser head or placed outside laser head into auxiliary harmonics generator module. Output wavelength switching is done manually. Motorized wavelength switching is available by request. Triggering of the laser is possible from built-in internal or external pulse generator. Pulses with TTL levels are required for external triggering. Laser pulses have less than 0.5 ns rms jitter with respect to Q-switch triggering pulse in both cases. The simple and field proven design ensures easy maintenance and reliable long-term operation of the NL310 series laser. Read more

Download datasheet here.

  • High energy nanosecond lasers
  • 10 J pulse energies
  • 4 – 10 ns pulse duration
  • 10 or 20 Hz pulse repetition rate


  • Up to 10 J output energy
  • Better than 0.5% rms pulse energy stability
  • 4 – 6 ns pulse duration
  • 10 or 20 Hz repetition rate
  • Thermo stabilized second, third, fourth and fifth harmonics generators
  • Remote control via keypad or USB-CAN port
  • Low jitter internal/external synchronization
  • Robust and stable laser head


  • OPO, Ti:S, dye laser pumping
  • Material processing
  • Plasma generation and diagnostics
  • Nonlinear spectroscopy
  • Remote sensing

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