• Precisely trigger up to 8 channels with the new Ekspla synchronization module and pulse delay generator

    SY4000 synchronization module 180502A

    Ekspla have introduceda new pulse synchronization module with delay generator. The SY4000 series module is designed to create up to 8 delayed output pulse sequences precisely synchronized to an internal or external clock. A photodetector or electrical signal can be used as the input source to be synchronized. The SY4000 delivers precise delay control from 2 ns to 150 ms, maintaining 25 ps timing resolution.

    SY4000 pulse delay generator gives the possibility to create different sequences, such as a delayed trigger or timed series. These features are employed in applications like creating sets of pulses to control Pockel’s cell drivers with one, two, or 4 triggering inputs.

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  • Ekspla FemtoLux 3: Microjoule Class Industrial Grade Femtosecond Fiber Laser

    FemtoLux 3 femtosecond microjoule class fiber laser 1

    Ekspla's FemtoLux 3 is a modern industrial femtosecond laser aimed for micromachining, engraving and ophthalmologic surgery applications. Laser delivers up to 3 W of average power and up to 2 μJ femtosecond pulse energy. FemtoLux 3 is a flexible platform which allows to optimize output parameters for the desired process. The repetition rate as well as the output power can be easily changed with integrated pulse picker. With burst mode enabled FemtoLux 3 can generate bursts of pulses with energy above 10 µJ with burst shape pre-programed or controlled in real time. Pulse duration can also be programed up to 5 ps. Read more.

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  • Ekspla PhotoSonus: Mobile High Energy Tunable Laser System for Photoacoustic Imaging

    PhotoSonus series High Energy tunable Lasers for PAT

    Following the demand of high output energies in the photoacoustic market for imaging larger volumes of tissue, the Ekspla PhotoSonus, a new high energy tunable laser source for photo-acoustic imaging has been introduced. Time-tested Ekspla nanosecond pump laser, parametric oscillator, power supply and cooling unit are integrated in a single robust housing to provide mobility and ease of use.

    Highly flexible PhotoSonus platform makes it easy to be integrated and used in a photoacoustic imaging system: it is fully motorized and computer controlled, have user trigger outputs/inputs and special functions as fast tuning between OPO wavelengths. Parametric oscillator generates output energies up to 200 mJ at peak. Achieving a highly uniform spatial distribution from OPO and adjustable beam diameter helps homogeneously couple various size fiber bundles and deliver balanced energy light to the target. By employing a wide range of other options (like access to OPO idler range, toggling between OPO and fundamental wavelengths through simultaneous output), this laser system can be modified to specific user requirements in order to expand photo-acoustic imaging possibilities. Read more.

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  • Ekspla Ultraflux: Tunable Wavelength Single Housing Femtosecond Laser System

    UltraFlux series Tunable Wavelength Femtosecond Laser System 1

    Introducing the UltraFlux Tunable wavelength femtosecond laser from Ekspla.

    UltraFlux is the first compact high energy tuneable wavelength femtosecond laser system which incorporates the advantages of ultrafast fiber laser, solid-state and parametric amplification technologies in less than 1 square meter footprint box. Patent pending (application No. EP2924500) OPCPA front end technology uses the same picosecond fiber laser for seeding both picosecond DPSS pump laser and femtosecond parametric amplifier by spectrally broadened output. Read more.

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  • Ekspla and Light Conversion lead consortium to deliver a 5 TW laser system

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    Ceremony held in the Residence of the Hungarian Ambassador in Vilnius, on the occasion of the contract made between the Lithuanian Ekspla/Liight Conversion consortium and the ELI-ALPS laser research center in Szeged, Hungary.

    A unique OPCPA based laser system, providing 5 terawatts of output power at 1 kHz repetition rate has been produced by a cosortium led by Ekspla and Light Conversion. The system, named Sylos 1, was designed and build for the Extreme Light Infrastructure - Attosecond Light Pulse Source facilities (ELI-ALPS) located in Szeged, Hungary.

    “This system is unique due to its outstanding combination of power and pulse duration” – noted Kestutis Jasiunas, EKSPLA CEO – “five terawatts establishes Sylos as one of the most powerful systems in the world generating 10 fs or shorter pulses at 1 kHz repetition rate. Secondly, it employs innovative OPCPA technology born and perfected at Vilnius University, Lithuania. Featuring comparatively simple and cost-effective layout OPCPA is a key approach in equipping the high intensity laser facility to reach attoseconds in deep UV regions.” Read more.

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  • Ekspla introduces brand updates and new logo


    Vilnius – November 16, 2016 - Celebrating 24 years of innovations, Ekspla, the manufacturer of lasers, laser systems and electronics has announced an updated brand identity including a new facelifted logo.

    Starting a new era in the company’s development, the refreshed brand sets an important milestone in Ekspla history. Maintaining close connections with scientific and engineering community, Ekspla has established itself as a scientifically curious team of creative engineers keen to take on new challenges.

    “Ekspla evolved from a small company established by several passionate engineers, to a worldwide reliable solutions provider while continuing to express the fundamental values of our Ekspla culture: to be capable, invent, contribute, to be credible, and be brave. These values reinforce and remain at the heart of our newly re-introduced brand” noted Kestutis Jasiunas, CEO of Ekspla. Read more.

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  • EKSPLA announce new UltraFlux series tunable wavelength femtosecond laser system based on OPCPA technology

    new tunable wavelength femtosecond system

    New tunable wavelength femtosecond system

    EKSPLA's UltraFlux is the first compact high energy femtosecond laser system which incorporates the advantages of ultrafast fiber laser, solid-state and parametric amplification technologies in less than 1 square meter footprint box. Patent pending (application No. EP2924500) OPCPA front end technology uses the same picosecond fiber laser for seeding both picosecond DPSS pump laser and femtosecond parametric amplifier by spectrally broadened output. This approach greatly simplifies the system – excludes femtosecond regenerative amplifier and eliminates the need of pump and seed pulse synchronization. In addition to that, contrast of the output pulses in picosecond to nanosecond time scale is potentially increased. Read more.

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  • Ekspla NT235 Series Tunable Wavelength NIR Range DPSS Laser

    NT235 series tunable nanosecond laser 2

    EKSPLA have introduced their new NT235 series tunable lasers offering hands free tuning from 335 to 2600 nm. Integrated into compact and monolithic housing, the diode pumped only Q-switched Nd:YAG laser and OPO features compact size, maintenance-free laser operation and improved stability (compared with flash-lamp pumped counterparts) making it an excellent choice for OEM integrators as well as laboratory set-ups. With its high, up to 10 mJ energy pulses at 100 Hz repetition rate, the NT235 series tunable laser establishes itself as a versatile tool for many applications, including photo acoustic imaging, laser induced fluorescence, flash photolysis, photobiology, metrology. Read more.

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  • Ekspla Atlantic Series high power picosecond DPSS laser now with higher specifications

    Ekspla Atlantic

    Ekspla's Atlanticis a new generation DPSS picosecond laser with 60 W output power at 1064 nm. Featuring short pulse duration (typically 13 ps) Atlantic series laser offers mimimized thermal damage to the material. Innovative design, employing fiber based oscillator ensured excellent output beam parameters: M²<1.3 with pulse energy fluctuations < 1.5 %. Up to 1 MHz repetition rate, establishes this laser as good choice for industrial, high throughoutput material processing systems.  Read more.

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